23 July 2015 Tolerance analysis of misalignment in an optical system using Shack–Hartmann wavefront sensor: experimental study
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Abstract
The wavefront aberrations induced by misalignments due to decentration and tilt of an optical component in an optical measurement system are presented. A Shack–Hartmann wavefront sensor is used to measure various aberrations caused due to the shifting of the axis and tilt of a lens in the path of an optical wavefront. One of the lenses in an optical system is decentered in the transverse direction and is tilted by using a rotational stage. For each step, wavefront data have been taken and data were analyzed up to the fourth order consisting of 14 Zernike terms along with peak-to-valley and root mean square values. Theoretical simulations using ray tracing have been carried out and compared with experimental values. The results are presented along with the discussion on tolerance limits for both decentration and tilt.
© 2015 Society of Photo-Optical Instrumentation Engineers (SPIE) 0091-3286 /2015/$25.00 © 2015 SPIE
Venkataramana Kalikivayi, Valiyaparambil Chacko Pretheesh Kumar, Krithivasan Kannan, and Angarai R. Ganesan "Tolerance analysis of misalignment in an optical system using Shack–Hartmann wavefront sensor: experimental study," Optical Engineering 54(7), 075104 (23 July 2015). https://doi.org/10.1117/1.OE.54.7.075104
Published: 23 July 2015
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Cited by 1 scholarly publication.
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KEYWORDS
Tolerancing

Monochromatic aberrations

Wavefronts

Photovoltaics

Wavefront sensors

Optical components

Optical testing

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