CONFERENCE PROCEEDINGS
Advanced Search
Jacqueline Lewis
at Stanford Univ
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 1 May 2023 Presentation + Paper
Molecular layer deposition of an Al-based hybrid resist for electron-beam and EUV lithography
Proceedings Volume 12498, 124981B (2023) https://doi.org/10.1117/12.2657636
KEYWORDS: Extreme ultraviolet lithography, Lithography, X-ray photoelectron spectroscopy, Scanning electron microscopy, Metals, Deep ultraviolet, Solubility, Electrons, Nanoparticles
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top