Dr. Jean-Benoit Claude Profile

Dr. Jean-Benoit Claude

at Institut Fresnel

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Publications (3)

Proceedings Article | 10 August 2022 Presentation

All-dielectric metalenses for improving pixel photodetector arrays: a step towards ultrafast single photon quantum sensor

Stefan Enoch, Redha Abdeddaim, Etiennette Auffray, Marthe Azzi, Jean-Benoit Claude, Andrea Ficorella, Alberto Gola, Kseniia Lezhennikova, Julien Lumeau, Stefano Merzi, Elena Mikheeva, Marco Pagagoni, Marco Pizzichemi, Matteo Salomoni, Jérôme Wenger, Paul Lecoq

Proceedings Volume PC12152, (2022) https://doi.org/10.1117/12.2621112

KEYWORDS: Single photon, Photodetectors, Ultrafast phenomena, Solar concentrators, Sensors, Silicon, GRIN lenses, Silicon photomultipliers, Refractive index, Picosecond phenomena

Proceedings Article | 30 May 2022 Presentation

Scalable disordered hyperuniform architectures on silica obtained by solid state dewetting

Monica Bollani, Chiara Barri, Mohammed Bouabdellaoui, Luca Fagiani, Zeinab Chehadi, Marco Salvalaglio, Axel Voigt, Alexey Fedorov, David Grosso, Jean-Benoit Claude, Jerome Wenger, Marco Abbarchi

Proceedings Volume PC12142, PC1214212 (2022) https://doi.org/10.1117/12.2620273

KEYWORDS: Silica, Dewetting, Solid state physics, Solid state electronics, Silicon, Microelectronics, Transform theory, Thin films, Solids, Sol-gels

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Proceedings Article | 18 April 2021 Presentation + Paper

Methylated silica surfaces having tapered nipple-dimple nano-pillar morphologies as robust broad-angle and broadband anti-reﬂection coatings

Mehrnaz Modaresialam, Jean-Benoît Claude, David Grosso, Marco Abbarchi

Proceedings Volume 11769, 117690Z (2021) https://doi.org/10.1117/12.2593454

KEYWORDS: Silica, Refractive index, Glasses, Polymers, Nanostructures, Nanoimprint lithography, Solar cells, Semiconducting wafers, Resistance, Nanolithography

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In this work, mechanically, chemically, and thermally resistant broadband and broad-angle antireﬂection coatings were prepared on 10 cm diameter glass substrates combining sol−gel deposition with nanoimprint lithography. The coatings are composed of water-repellent methylated silica (Si₄O₇Me₂) and exhibit a transverse refractive index gradient created by tapered, nipple-dimple, subwavelength nanostructures, featuring a record vertical aspect ratio of ∼1.7. The structure is composed of hexagonal arrays of nanopillars (∼200 nm height, ∼120 nm width) and holes (∼50 nm depth, ∼100 nm width) with a 270 nm pitch. The corresponding eﬀective refractive index is between 1.2 and 1.26, depending on the fabrication conditions. Total transmission for double-face nanoimprint wafers reaches 96−97% in the visible range; it is limited by specular reﬂection and mostly by the intrinsic diﬀusion of the glass substrate. The antireﬂective eﬀect is eﬀective up to an ∼60° incidence angle. We address the robustness of the inorganic-based coating in various realistic and extreme conditions, comparing them to the organic perﬂuoropolyether (PFPE) counterpart (master reference). The sol−gel system is extremely stable at high temperature (up to 600 °C, against 200 °C for the polymer reference). Both systems showed excellent chemical stability, except in strong alkaline conditions. The inorganic nanostructure showed an abrasion resistance of more than 2 orders of magnitude superior to the polymer one with less than 20% loss of antireﬂective performance after 2000 rubbing cycles under an ∼2 N cm⁻² pressure. This diﬀerence springs from the large elastic modulus of the sol−gel material combined with an excellent adhesion to the substrate and to the speciﬁc nipple-dimple conformation. The presence of holes allows maintaining a refractive index gradient proﬁle even after tearing out part of the nanopillar population. Our results are relevant to applications where transparent windows with broadband and broad-angle transmission are needed, such as protective glasses on photovoltaic cells or C-MOS cameras.

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