|
Fluoropolymers, such as polytetrafluoroethylene (PTFE) and perfluoroalkoxy alkane (PFA), have been used widely in the fab to filter chemistries that require instant surface wettability and high flow rates. These requirements now align more closely with today’s leading-edge lithography materials. After a review of the motivation behind choosing new filtration materials in the lithography sector, this paper will identify the critical material attributes, specific design considerations, and the importance of membrane surface technologies, beginning in the photoresist manufacturing process. Data presented will include laboratory studies of fluoropolymer membranes in common solvents, on-wafer defect data, and bulk filtration manufacturing data, all showing the match between fluoropolymer filters and photolithography materials. |
ACCESS THE FULL ARTICLE
No SPIE Account? Create one
Metals
Lithography
Chemistry
Optical lithography
