Engineering resist-substrate interface: a quantum chemistry study of self-assembled monolayers

Jonathan H. Ma; Isvar A. Cordova; Rudy Wojtecki; Andrew Neureuther; Patrick P. Naulleau

doi:10.1117/12.2574879

20 September 2020 Engineering resist-substrate interface: a quantum chemistry study of self-assembled monolayers

Jonathan H. Ma, Isvar A. Cordova, Rudy Wojtecki, Andrew Neureuther, Patrick P. Naulleau

Proceedings Volume 11517, Extreme Ultraviolet Lithography 2020; 115170H (2020) https://doi.org/10.1117/12.2574879
Event: SPIE Photomask Technology + EUV Lithography, 2020, Online Only

Abstract

In EUV lithography, radiation chemistry is largely different from DUV. Engineers have explored self-assembled monolayers (SAM) in the context of lithography and some of their properties could be utilized in EUV. We study SAMs and their interaction with substrates using quantum chemistry. Interface chemistry between resists and underlayers is playing an increasingly important role in EUV. it is conceivable that the resist molecules near the interface are susceptible to activation by electrons originated in the substrate. For their monolayer nature and spontaneous ordering, SAMs can be used for engineering interface properties in a predictable manner. Understanding the physical and chemical processes at the interface in the presence of SAMs would be vital for better modelling their effects on imaging. To address these questions, quantum chemistry is used to understand the properties of SAMs, such as their packing order. The surface electronic structure is also studied to elucidate the physical properties at the interface that could impact EUV dose.

Conference Presentation

Citation Download Citation

Jonathan H. Ma, Isvar A. Cordova, Rudy Wojtecki, Andrew Neureuther, and Patrick P. Naulleau "Engineering resist-substrate interface: a quantum chemistry study of self-assembled monolayers", Proc. SPIE 11517, Extreme Ultraviolet Lithography 2020, 115170H (20 September 2020); https://doi.org/10.1117/12.2574879

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available