Presentation
24 February 2021 Multi-beam mask writer MBM-2000 (Conference Presentation)
Author Affiliations +
Abstract
A multi-beam mask writer MBM-2000 is developed for the 3 nm technology node. It is designed to expose EUV blanks with beamlets of total current 1.6 uA at high throughput. It also supports writing leading-edge photomasks by equipping a correction function for glass thermal expansion and high-speed data path. Fast writing modes are provided for middle-grade photomask writing. Inline function of pixel level dose correction (PLDC) is implemented to reduce mask turnaround time by replacing offline corrections with PLDC, with additional benefit of fidelity improvement by dose enhancement. In this paper, writing results of MBM-2000 are reported and discussed.
Conference Presentation
© (2021) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hiroshi Matsumoto, Keisuke Yamaguchi, Hayato Kimura, and Noriaki Nakayamada "Multi-beam mask writer MBM-2000 (Conference Presentation)", Proc. SPIE 11610, Novel Patterning Technologies 2021, 116100Y (24 February 2021); https://doi.org/10.1117/12.2586288
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KEYWORDS
Data processing

Distortion

Optical design

Photomasks

Forward error correction

Glasses

Laser scattering

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