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14 September 2021 A priori information in ptychographic image reconstruction for EUV mask metrology
Ricarda Nebling, Iacopo Mochi, Hyun-Su Kim, Atoosa Dejkameh, Tao Shen, Yasin Ekinci
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Proceedings Volume 11875, Computational Optics 2021; 118750M (2021) https://doi.org/10.1117/12.2600233
Event: SPIE Optical Systems Design, 2021, Online Only
Abstract
EUV photomasks define the lithographic layers of chips, which are binary structures of relatively low versatility in contrast to specimen in biology or materials science. This knowledge can be used in EUV photomask imaging and inspection methods to improve the speed or sensitivity. We present here a total variation-based phase retrieval algorithm similar to previous methods by Chang et al. and Enfedaque et al. for EUV mask imaging and metrology. Total variation (TV) regularization exploits the binary structure of the reticles, enforcing a sparse sample gradient. We compare the TV regularized algorithm, PtychoADMM, to a standard phase retrieval approach, the difference map (DM). For simulated data containing Poisson noise, we do not observe a benefit from using the TV based PtychoADMM algorithm. The reconstructed image quality is similar, while PtychoADMM being a computationally more demanding method. In future, we will investigate if TV can recover information where the standard DM approach fails, e.g. for relaxed measurement requirements like a lower signal to noise ratio or less probe overlap in the ptychography scan.
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Ricarda Nebling, Iacopo Mochi, Hyun-Su Kim, Atoosa Dejkameh, Tao Shen, and Yasin Ekinci "A priori information in ptychographic image reconstruction for EUV mask metrology", Proc. SPIE 11875, Computational Optics 2021, 118750M (14 September 2021); https://doi.org/10.1117/12.2600233
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KEYWORDS
Reconstruction algorithms
Extreme ultraviolet
Photomasks
Metrology
Computer simulations
Inspection
Diffraction
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