Efficient patterning approaches for non-Manhattan layouts by using variable shaped beam systems

Ines Stolberg; Eike Linn; Ulf Weidenmueller; Matthias Slodowski

doi:10.1117/12.2688360

21 November 2023 Efficient patterning approaches for non-Manhattan layouts by using variable shaped beam systems

Ines Stolberg, Eike Linn, Ulf Weidenmueller, Matthias Slodowski

Proceedings Volume 12751, Photomask Technology 2023; 127510K (2023) https://doi.org/10.1117/12.2688360
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Abstract

Photonics applications generate more and more interest and they are on the way from research to commercially available products. However, due to versatility and the currently related manufacturing volume of the potential applications, efficient patterning techniques are required. Vistec’s electron-beam lithography systems with Variable Shaped Beam (VSB) and Cell Projection (CP) provide a flexible solution to generate these kind of photonics structures even on large areas. In case of arbitrary curved structures intelligent data preparation software solutions as JES-approximation and target contour calculation can be applied. An example is given to demonstrate the feasibility of these approaches specifically on cell projection.

Conference Presentation

(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Ines Stolberg, Eike Linn, Ulf Weidenmueller, and Matthias Slodowski "Efficient patterning approaches for non-Manhattan layouts by using variable shaped beam systems", Proc. SPIE 12751, Photomask Technology 2023, 127510K (21 November 2023); https://doi.org/10.1117/12.2688360

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