New multi-beam mask data preparation method for EUV high volume data

Kyungsup Shin; Sunyoung Kim; Jihyeon Choi; Eokbong Kim; Sanghee Lee; Harald Hoeller-Lugmayr; Amir Moqanaki; Annette Schnettelker; Mathias Tomandl; Christof Zillner; Yohei Torigoe; Taigo Fujii; Ryunosuke Miyake; Mizuki Odaka; Issei Masumoto; Masakazu Hamaji

doi:10.1117/12.2683168

29 September 2023 New multi-beam mask data preparation method for EUV high volume data

Kyungsup Shin, Sunyoung Kim, Jihyeon Choi, Eokbong Kim, Sanghee Lee, Harald Hoeller-Lugmayr, Amir Moqanaki, Annette Schnettelker, Mathias Tomandl, Christof Zillner, Yohei Torigoe, Taigo Fujii, Ryunosuke Miyake, Mizuki Odaka, Issei Masumoto, Masakazu Hamaji

Author Affiliations +

Proceedings Volume 12915, Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology; 129150D (2023) https://doi.org/10.1117/12.2683168
Event: Photomask Japan 2023, 2023, Online Only

Abstract

Since the design nodes gradually decreased and EUV production became reality, the data volume is continuously increasing due to Hard OPC & Flare Correction. Multi-Beam Mask Writers (MBMW) enabled mask exposures with curvilinear and circle pattern that have not been possible before. This soon led to an increase in the number of vertexes of design data and an increase in Mask Data Preparation turnaround times (MDP TAT). A data flow based on the newly developed MBW-2 file format was developed jointly with Nippon Control System and IMS nanofabrication and significantly improved MDP TAT. The effect was confirmed by verifying it with actual data using large-volume data and curvilinear data EUV masks exposed on MBMW. In addition, the MDP TAT was further improved by studying file write method. In this paper, we introduce the concept and application of the new data flow. Furthermore we will present the results on TAT and output file sizes. Finally, we will discuss each step in the data flow in detail.

(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

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Kyungsup Shin, Sunyoung Kim, Jihyeon Choi, Eokbong Kim, Sanghee Lee, Harald Hoeller-Lugmayr, Amir Moqanaki, Annette Schnettelker, Mathias Tomandl, Christof Zillner, Yohei Torigoe, Taigo Fujii, Ryunosuke Miyake, Mizuki Odaka, Issei Masumoto, and Masakazu Hamaji "New multi-beam mask data preparation method for EUV high volume data", Proc. SPIE 12915, Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 129150D (29 September 2023); https://doi.org/10.1117/12.2683168

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KEYWORDS

Design and modelling

Extreme ultraviolet

Electronic design automation

Algorithm development

Data conversion

Mathematical optimization

Lithography

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