Heating of x-ray masks during e-beam writing

Nikolai L. Krasnoperov; Jaz Bansel; Olga Vladimirsky; John P. Wallace; Yuli Vladimirsky; Franco Cerrina

doi:10.1117/12.351083

25 June 1999 Heating of x-ray masks during e-beam writing

Nikolai L. Krasnoperov, Jaz Bansel, Olga Vladimirsky, John P. Wallace, Yuli Vladimirsky, Franco Cerrina

Proceedings Volume 3676, Emerging Lithographic Technologies III; (1999) https://doi.org/10.1117/12.351083
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

In this work we characterized the temperature increase in SiHN mask membrane during e-beam writing. We observed an exponential decay with a decay length in the order of 1mm^-1, and absolute temperature raises of 8 degrees K. This is the first time that direct measurement have been obtained. By fitting the observed data, we have extracted the thermal conductivity and emissivity of the film. These experimental values are essential in the modeling of the response of the masks.

Citation Download Citation

Nikolai L. Krasnoperov, Jaz Bansel, Olga Vladimirsky, John P. Wallace, Yuli Vladimirsky, and Franco Cerrina "Heating of x-ray masks during e-beam writing", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); https://doi.org/10.1117/12.351083

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