At-wavelength observation of phase defect using focused lensless microscope

Tetsuo Harada; Yusuke Tanaka; Tsuyoshi Amano; Youichi Usui; Takeo Watanabe; Hiroo Kinoshita

doi:10.1117/12.2050936

17 April 2014 At-wavelength observation of phase defect using focused lensless microscope

Tetsuo Harada, Yusuke Tanaka, Tsuyoshi Amano, Youichi Usui, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 9048, Extreme Ultraviolet (EUV) Lithography V; 90483F (2014) https://doi.org/10.1117/12.2050936
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

To evaluate defects on extreme ultraviolet (EUV) masks at the blank state of manufacturing, we developed a micro coherent EUV scatterometry microscope (micro-CSM). The illumination source is coherent EUV light with a 230-nm focus diameter on the defect using a Fresnel zoneplate. This system directly observes the reflection and scattering signals from a phase defect. The scattering distributions of 30-nm-wide defects were anisotropic due to interference with speckle from multilayer scattering. Thus, printability of the defects would depend on the defect position in the multilayer.

Citation Download Citation

Tetsuo Harada, Yusuke Tanaka, Tsuyoshi Amano, Youichi Usui, Takeo Watanabe, and Hiroo Kinoshita "At-wavelength observation of phase defect using focused lensless microscope", Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 90483F (17 April 2014); https://doi.org/10.1117/12.2050936

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