Fundamental study of inorganic middle layer film for EUV patterning

Soichiro Okada; Keisuke Yoshida; Hiroyuki Fujii; Satoru Shimura

doi:10.1117/12.2614092

13 June 2022 Fundamental study of inorganic middle layer film for EUV patterning

Soichiro Okada, Keisuke Yoshida, Hiroyuki Fujii, Satoru Shimura

Proceedings Volume PC12055, Advances in Patterning Materials and Processes XXXIX; PC120550O (2022) https://doi.org/10.1117/12.2614092
Event: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States

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Soichiro Okada, Keisuke Yoshida, Hiroyuki Fujii, and Satoru Shimura "Fundamental study of inorganic middle layer film for EUV patterning", Proc. SPIE PC12055, Advances in Patterning Materials and Processes XXXIX, PC120550O (13 June 2022); https://doi.org/10.1117/12.2614092

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