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24 November 2023 Investigation of the impact of defects in etched fused silica on laser damage to improve the performance of pulse-compression gratings
Russell S. Dent, Hu Huang, Alexei A. Kozlov, Amy L. Rigatti, Alexander A. Shestopalov, Stavros G. Demos
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Proceedings Volume PC12726, Laser-Induced Damage in Optical Materials 2023; PC127260I (2023) https://doi.org/10.1117/12.2686229
Event: SPIE Laser Damage, 2023, Dublin/Livermore, California, United States
Abstract
This work explores reactive ion etching parameters in order to identify and optimize key characteristics in gratings that govern their overall performance, including minimization of sidewall and trench structural defects and modification of fused silica via intrinsic molecular-level defects. This study is performed using grating-like samples with 5-µm-wide lines and trenches generated in fused silica by the photolithographic process and inductively coupled plasma-reactive ion etching. The analysis compiles metrology, simulation, and damage-testing results to obtain a better understanding of how to modify the fabrication process of gratings toward achieving better laser-induced–damage performance.
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Russell S. Dent, Hu Huang, Alexei A. Kozlov, Amy L. Rigatti, Alexander A. Shestopalov, and Stavros G. Demos "Investigation of the impact of defects in etched fused silica on laser damage to improve the performance of pulse-compression gratings", Proc. SPIE PC12726, Laser-Induced Damage in Optical Materials 2023, PC127260I (24 November 2023); https://doi.org/10.1117/12.2686229
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KEYWORDS
Silica
Design and modelling
Optical gratings
Laser damage threshold
Laser induced damage
Etching
Fabrication
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