Resources from SPIE for Lithographers

Harry Levinson

doi:10.1117/1.JMM.23.1.010101

12 March 2024 Resources from SPIE for Lithographers

Harry Levinson

Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 1, 010101 (March 2024). https://doi.org/10.1117/1.JMM.23.1.010101

Abstract

Editor-in-Chief Harry Levinson recalls the key role SPIE proceedings played in his early career.

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Harry Levinson "Resources from SPIE for Lithographers," Journal of Micro/Nanopatterning, Materials, and Metrology 23(1), 010101 (12 March 2024). https://doi.org/10.1117/1.JMM.23.1.010101

Published: 12 March 2024

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KEYWORDS

Lithography

Optical lithography

Semiconductors

Engineering

Vacuum

Physics

Photoemission spectroscopy

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