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Dr. Jiahao Xi
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Publications (1)
Proceedings Article | 10 April 2024 Poster + Paper
Photoresist process simulation to study line edge roughness
Yufei Sha, Shuxin Yao, Miao Jiang, Hao Yang, Di Liang, Cuixiang Wang, Futian Wang, Enqiang Tian, Jiahao Xi, Yulong Jiang, Jiangliu Shi
Proceedings Volume 12953, 1295317 (2024) https://doi.org/10.1117/12.3010734
KEYWORDS: Photoresist materials, Line edge roughness, Quenching, Photoresist developing, Diffusion, Polymers, Acid diffusion length, Photoacid generators, Lithography, Line width roughness
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