CONFERENCE PROCEEDINGS
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Miao Jiang
at Beijing Superstring Academy of Memory Technology
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Author
Publications (4)
Proceedings Article | 10 April 2024 Poster + Paper
Photoresist process simulation to study line edge roughness
Yufei Sha, Shuxin Yao, Miao Jiang, Hao Yang, Di Liang, Cuixiang Wang, Futian Wang, Enqiang Tian, Jiahao Xi, Yulong Jiang, Jiangliu Shi
Proceedings Volume 12953, 1295317 (2024) https://doi.org/10.1117/12.3010734
KEYWORDS: Photoresist materials, Line edge roughness, Quenching, Photoresist developing, Diffusion, Polymers, Acid diffusion length, Photoacid generators, Lithography, Line width roughness
Proceedings Article | 21 November 2023 Poster + Paper
Quantitative study of local MEEF of 2D mask corrected by inverse lithography technology
Futian Wang, Song Sun, Chunlong Yu, Yu Mu, Juan Wei, Xiaonan Liu, Cuixiang Wang, Liang Li, Qingchen Cao, Miao Jiang, Peng Xu, Joshua Jeong, Yilei Zeng, Andy Lan, Jiangliu Shi
Proceedings Volume 12751, 1275117 (2023) https://doi.org/10.1117/12.2686740
KEYWORDS: Optical proximity correction, Lithography, Semiconducting wafers, Resolution enhancement technologies, Logic, Electron beam lithography, Vestigial sideband modulation, Photomask technology, Manufacturing
Proceedings Article | 28 April 2023 Poster + Paper
Frequency doubling and phase error tolerance exploration for chrome-less phase shift mask
Proceedings Volume 12494, 1249413 (2023) https://doi.org/10.1117/12.2657844
KEYWORDS: Tolerancing, Semiconducting wafers, Simulations, Reticles, Phase shifts, Etching, Resolution enhancement technologies, Quartz
Proceedings Article | 27 April 2023 Poster + Paper
Frame generation methodology in mask tape-out flow and automation application
Binbin Yan, Miao Jiang, Futian Wang, Di Liang, Liang Li, Wei Feng, Joer Huang, Dajun Wu, Andy Lan, Jiangliu Shi
Proceedings Volume 12496, 124962K (2023) https://doi.org/10.1117/12.2657841
KEYWORDS: Optical alignment, Overlay metrology, Automation, Metrology
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