Ms. Jiali Wu Profile

Jiali Wu

at Tongji Univ

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 30 April 2024 Paper

Development of the Sc/Si multilayer mirrors with high spectral selectivity for the Solar Upper Transition Region Imager

Jiali Wu, Runze Qi, Yue Yu, Jun Yu, Zhe Zhang, Zhong Zhang, Qiushi Huang, Zhanshan Wang

Proceedings Volume 13153, 131531A (2024) https://doi.org/10.1117/12.3018894

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SPIE Journal Paper | 10 February 2022 Open Access

Laboratory-based reflectometer using line spectra of an RF-induced gas-discharge lamp in 30- to 200-nm wavelength range

Yue Yu, Zeyi Ye, Li Jiang, Qianxia Yao, Shuangying Li, Jiali Wu, Jinlong Zhang, Qiushi Huang, Chun Xie, Andrey Sokolov, Hongjun Zhou, Tonglin Huo, Wenbin Li, Zhanshan Wang

JATIS, Vol. 8, Issue 01, 017002, (February 2022) https://doi.org/10.1117/12.10.1117/1.JATIS.8.1.017002

KEYWORDS: Reflectometry, Reflectivity, Light sources, Lamps, Monochromators, Mirrors, Sensors, Extreme ultraviolet, Collimators, Collimation

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Proceedings Article | 8 July 2021 Open Access

Composition analysis of boron carbide coatings prepared by reactive sputtering with nitrogen

Jiali Wu, Qiushi Huang, Runze Qi, Yufei Feng, Zhanshan Wang

Proceedings Volume 11886, 118860V (2021) https://doi.org/10.1117/12.2593360

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Proceedings Article | 18 April 2021 Presentation + Paper

Damage study on B4C films using a table-top nanosecond EUV damage instrument

Wenbin Li, Chunlin Wang, Liuyang Pan, Jiali Wu, Jinyu Cao, Qiushi Huang, Chun Xie, Zhanshan Wang

Proceedings Volume 11776, 117760V (2021) https://doi.org/10.1117/12.2590040

KEYWORDS: Extreme ultraviolet, Sputter deposition, Free electron lasers, Chromium, Adhesives, Scanning electron microscopy, Laser damage threshold, Coating, X-rays, Resistance

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Proceedings Article | 21 August 2020 Presentation + Paper

Structure and stability of Sc/Si multilayers with different thickness ratio for wavelength at 46.5 nm

Jiali Wu, Runze Qi, Zhanshan Wang, Qiushi Huang, Xianyong Bai

Proceedings Volume 11491, 1149106 (2020) https://doi.org/10.1117/12.2567335

KEYWORDS: Reflectivity, Interfaces, Silicon, Solar processes, Extreme ultraviolet, Sputter deposition, Solar energy, Diffusion, Atomic force microscopy

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