Dr. Philippe Bandelier
at CEA-LETI
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 7 March 2008 Paper
Proceedings Volume 6924, 69242G (2008) https://doi.org/10.1117/12.772584
KEYWORDS: Nanoimprint lithography, Critical dimension metrology, Interferometers, Scanners, Interferometry, Lithography, Image processing, Photoresist materials, Modulation, Semiconducting wafers

Proceedings Article | 21 March 2006 Paper
Anne-Laure Charley, Alexandre Lagrange, Olivier Lartigue, Philippe Bandelier, Marianne Derouard, Patrick Schiavone
Proceedings Volume 6154, 61541Z (2006) https://doi.org/10.1117/12.654404
KEYWORDS: Polarization, Interferometers, Line edge roughness, Line width roughness, Diffraction gratings, Diffraction, Interferometry, Printing, Photoresist materials, Liquids

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