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Takayuki Sao
at Merck Performance Materials Manufacturing G.K.
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Publications (1)
Proceedings Article | 10 April 2024 Presentation
Sustainable solutions to PFAS photoacid generators used in chemically amplified resists
Daniela Carja, Hung-Yang Chen, Takayuki Sao, Hiroshi Hitokawa, Philipp-Hans Fackler, Chunwei Chen, Ralph Dammel
Proceedings Volume 12957, 1295703 (2024) https://doi.org/10.1117/12.3010645
KEYWORDS: Photoacid generators, Sustainability, Chemically amplified resists, Photoresist materials, Transparency, Photoresist developing, Lithography, Toxicity, Thermal stability, Structural design
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