Dr. Hung-Yang Chen
at EMD Performance Materials, Merck KGaA
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 10 April 2024 Presentation
Daniela Carja, Hung-Yang Chen, Takayuki Sao, Hiroshi Hitokawa, Philipp-Hans Fackler, Chunwei Chen, Ralph Dammel
Proceedings Volume 12957, 1295703 (2024) https://doi.org/10.1117/12.3010645
KEYWORDS: Photoacid generators, Sustainability, Chemically amplified resists, Photoresist materials, Transparency, Photoresist developing, Lithography, Toxicity, Thermal stability, Structural design

Proceedings Article | 9 April 2024 Poster + Paper
Proceedings Volume 12957, 129571H (2024) https://doi.org/10.1117/12.3009506
KEYWORDS: Photoresist materials, Photoacid generators, Copper, Silicon, Film thickness, Lithography, Semiconductors, Semiconducting wafers, Fabrication, Photoresist developing

Proceedings Article | 1 May 2023 Poster + Paper
Ashley Moore, Julia Modl, Zhong Li, Hung-Yang Chen, Chunwei Chen, Andreas Behrendt, Katharina Schmoelzer
Proceedings Volume 12498, 124981J (2023) https://doi.org/10.1117/12.2657687
KEYWORDS: Photoresist materials, Etching, Adhesion, Wet etching, Copper, Metals, Semiconducting wafers, Coating, Lithography, Photoresist developing

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