PROCEEDINGS VOLUME 1089
1989 SANTA CLARA SYMPOSIUM ON MICROLITHOGRAPHY | FEB 27 - MAR 3 1989
Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII
IN THIS VOLUME

0 Sessions, 39 Papers, 0 Presentations
All Papers  (39)
1989 SANTA CLARA SYMPOSIUM ON MICROLITHOGRAPHY
Feb 27 - Mar 3 1989
San Jose, CA, United States
All Papers
Proc. SPIE 1089, Focused Ion Beam Patterning of High Tc Superconductor Films, 0000 (1 August 1989); doi: 10.1117/12.968508
Proc. SPIE 1089, Redundancy Technology With A Focused Ion Beam, 0000 (1 August 1989); doi: 10.1117/12.968509
Proc. SPIE 1089, Focused-Ion-Beam Induced Deposition Of Metal For Microcircuit Modification, 0000 (1 August 1989); doi: 10.1117/12.968510
Proc. SPIE 1089, Image-Projection Ion-Beam Lithography, 0000 (1 August 1989); doi: 10.1117/12.968511
Proc. SPIE 1089, GaAs FET Mushroom Gate Fabricated By FIB/EB Hybrid Lithography, 0000 (1 August 1989); doi: 10.1117/12.968512
Proc. SPIE 1089, Repair Of Dear Defects On X-Ray Masks By Ion-Induced Metal Deposition, 0000 (1 August 1989); doi: 10.1117/12.968513
Proc. SPIE 1089, FIB-Assisted Cl2 Gas Etching of GaAs, 0000 (1 August 1989); doi: 10.1117/12.968514
Proc. SPIE 1089, Lithography Wand-Fabrication And Applications Of Novel Microstructures For Electron And Ion Beam Nanometer Lithography, 0000 (1 August 1989); doi: 10.1117/12.968515
Proc. SPIE 1089, Electron Beam Lithography Using A New Quadrupole Triplet, 0000 (1 August 1989); doi: 10.1117/12.968516
Proc. SPIE 1089, Strategies For A Universal Marker Search System For A-Beam Lithography, 0000 (1 August 1989); doi: 10.1117/12.968517
Proc. SPIE 1089, Fabrication Of 5X Reticles Fore 16M DRAMS By Using A Variable-Shaped Electron-Beam System, 0000 (1 August 1989); doi: 10.1117/12.968518
Proc. SPIE 1089, Processing Methods for the Fabrication of Sub-0.25 µm GaAs Heterostructure Devices and Circuits, 0000 (1 August 1989); doi: 10.1117/12.968519
Proc. SPIE 1089, Electron-Beam Written Multilevel Resist Process Applied To GaAs FET Gate Fabrication, 0000 (1 August 1989); doi: 10.1117/12.968520
Proc. SPIE 1089, Electron Beam Lithography And Resist Processing For The Fabrication Of T-Gate Structures, 0000 (1 August 1989); doi: 10.1117/12.968521
Proc. SPIE 1089, A PMMA/PMGI Two Layer Resist System for Stable Lift-off Processing, 0000 (1 August 1989); doi: 10.1117/12.968522
Proc. SPIE 1089, SOR Lithography in West Germany, 0000 (1 August 1989); doi: 10.1117/12.968523
Proc. SPIE 1089, Synchrotron X-ray Lithography System Using A Compact Source, 0000 (1 August 1989); doi: 10.1117/12.968524
Proc. SPIE 1089, Preliminary Testing Results For A New X-Ray Stepper, 0000 (1 August 1989); doi: 10.1117/12.968525
Proc. SPIE 1089, Soft X-Ray Induced Chemical Reactions In Novolak Resist, 0000 (1 August 1989); doi: 10.1117/12.968526
Proc. SPIE 1089, Automatic Mask Inspection System Using X-ray As A Source, 0000 (1 August 1989); doi: 10.1117/12.968527
Proc. SPIE 1089, Fabrication of 0.5 µm MOS Test Devices by Application of X-ray Lithography at All Levels, 0000 (1 August 1989); doi: 10.1117/12.968528
Proc. SPIE 1089, Fabrication of 1-Mbit DRAMs By Using X-Ray Lithography, 0000 (1 August 1989); doi: 10.1117/12.968529
Proc. SPIE 1089, Development Of Radiation Cooled Slotted Rotating Target X-Ray Source, 0000 (1 August 1989); doi: 10.1117/12.968530
Proc. SPIE 1089, The Application Of Ion Beam Assisted Deposition Of Chrome To Photomask Repair, 0000 (1 August 1989); doi: 10.1117/12.968531
Proc. SPIE 1089, X-Ray Exposure System With Plasma Source For Microlithography, 0000 (1 August 1989); doi: 10.1117/12.968532
Proc. SPIE 1089, Design Of An X-Ray Lithograahy Beam Line, 0000 (1 August 1989); doi: 10.1117/12.968533
Proc. SPIE 1089, A High Throughput Electron Lithography System Using A Field Emission Gun, 0000 (1 August 1989); doi: 10.1117/12.968534
Proc. SPIE 1089, High Efficiency X-ray Zoneplates by Layering and Index Grading, 0000 (1 August 1989); doi: 10.1117/12.968535
Proc. SPIE 1089, Laser Plasma As X-Ray Source For Lithographic Imaging, 0000 (1 August 1989); doi: 10.1117/12.968536
Proc. SPIE 1089, Resist Modeling Near Resolution And Sensitivity Limits In X -Ray Lithography, 0000 (1 August 1989); doi: 10.1117/12.968537
Proc. SPIE 1089, E-Beam Application Of Highly Sensitive Positive And Negative-Tone Resists For X-Ray Mask Making, 0000 (1 August 1989); doi: 10.1117/12.968538
Proc. SPIE 1089, Soft Vacuum Pulsed Electron Beam Processing Of Tenon And Teflon-Like Films, 0000 (1 August 1989); doi: 10.1117/12.968539
Proc. SPIE 1089, Influence Of The Structure And Functionality Of Photoactive Compounds On The Performance Of Novolak Based E-Beam Resists, 0000 (1 August 1989); doi: 10.1117/12.968540
Proc. SPIE 1089, Novel Chemical Amplification System in Azide/Phenolic Resin-Based Negative Resist, 0000 (1 August 1989); doi: 10.1117/12.968541
Proc. SPIE 1089, Nelative-Working Electron Beam Resist Based on Poly(methylmethacrylate), 0000 (1 August 1989); doi: 10.1117/12.968542
Proc. SPIE 1089, 0.25 µm Trench Etching By ECR Plasma, 0000 (1 August 1989); doi: 10.1117/12.968543
Proc. SPIE 1089, Effect Of Charging On Pattern Placement Accuracy In E-Beam Lithography, 0000 (1 August 1989); doi: 10.1117/12.968544
Proc. SPIE 1089, The Effect Of EB Dose On Hot Carrier Induced Degradation Of Mos Transistors, 0000 (1 August 1989); doi: 10.1117/12.968545
Proc. SPIE 1089, Recent Results In The Application Of Electron Beam Direct-Write Lithography, 0000 (1 August 1989); doi: 10.1117/12.968546
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