Novel EUV photoresist for sub-7nm node (Conference Presentation)

Tsuyoshi Furukawa; Takehiko Naruoka; Hisashi Nakagawa; Hiromu Miyata; Motohiro Shiratani; Masafumi Hori; Satoshi Dei; Ramakrishnan Ayothi; Yoshi Hishiro; Tomoki Nagai

doi:10.1117/12.2258164

5 May 2017 Novel EUV photoresist for sub-7nm node (Conference Presentation)

Tsuyoshi Furukawa, Takehiko Naruoka, Hisashi Nakagawa, Hiromu Miyata, Motohiro Shiratani, Masafumi Hori, Satoshi Dei, Ramakrishnan Ayothi, Yoshi Hishiro, Tomoki Nagai

Author Affiliations +

Proceedings Volume 10143, Extreme Ultraviolet (EUV) Lithography VIII; 101430X (2017) https://doi.org/10.1117/12.2258164
Event: SPIE Advanced Lithography, 2017, San Jose, California, United States

Abstract

Extreme ultraviolet (EUV) lithography has been recognized as a promising candidate for the manufacturing of semiconductor devices as LS and CH pattern for 7nm node and beyond. EUV lithography is ready for high volume manufacturing stage. For the high volume manufacturing of semiconductor devices, significant improvement of sensitivity and line edge roughness (LWR) and Local CD Uniformity (LCDU) is required for EUV resist. It is well-known that the key challenge for EUV resist is the simultaneous requirement of ultrahigh resolution (R), low line edge roughness (L) and high sensitivity (S). Especially high sensitivity and good roughness is important for EUV lithography high volume manufacturing.

We are trying to improve sensitivity and LWR/LCDU from many directions. From material side, we found that both sensitivity and LWR/LCDU are simultaneously improved by controlling acid diffusion length and efficiency of acid generation using novel resin and PAG. And optimizing EUV integration is one of the good solution to improve sensitivity and LWR/LCDU. We are challenging to develop new multi-layer materials to improve sensitivity and LWR/LCDU. Our new multi-layer materials are designed for best performance in EUV lithography system. From process side, we found that sensitivity was substantially improved maintaining LWR applying novel type of chemical amplified resist (CAR) and process. EUV lithography evaluation results obtained for new CAR EUV interference lithography. And also metal containing resist is one possibility to break through sensitivity and LWR trade off. In this paper, we will report the recent progress of sensitivity and LWR/LCDU improvement of JSR novel EUV resist and process.

Conference Presentation

Citation Download Citation

Tsuyoshi Furukawa, Takehiko Naruoka, Hisashi Nakagawa, Hiromu Miyata, Motohiro Shiratani, Masafumi Hori, Satoshi Dei, Ramakrishnan Ayothi, Yoshi Hishiro, and Tomoki Nagai "Novel EUV photoresist for sub-7nm node (Conference Presentation)", Proc. SPIE 10143, Extreme Ultraviolet (EUV) Lithography VIII, 101430X (5 May 2017); https://doi.org/10.1117/12.2258164

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