Subpixel pattern edge placement controllability of digital scanner

Yuho Kanaya; Yoji Watanabe; Yusuke Saito; Toshiaki Sakamoto; Soichi Owa; Noriyuki Hirayanagi; Thomas Koo; Craig Poppe; David Tseng; Conrad Sorensen; Hwan Lee; Stephen Renwick; Bausan Yuan

doi:10.1117/12.2600898

12 October 2021 Subpixel pattern edge placement controllability of digital scanner

Yuho Kanaya, Yoji Watanabe, Yusuke Saito, Toshiaki Sakamoto, Soichi Owa, Noriyuki Hirayanagi, Thomas Koo, Craig Poppe, David Tseng, Conrad Sorensen, Hwan Lee, Stephen Renwick, Bausan Yuan

Author Affiliations +

Proceedings Volume 11855, Photomask Technology 2021; 1185508 (2021) https://doi.org/10.1117/12.2600898
Event: SPIE Photomask Technology + EUV Lithography, 2021, Online Only

Abstract

The Digital Scanner (DS) being developed by Nikon is an optical maskless exposure tool with DUV light source and a micromirror-type spatial light modulator (SLM). The SLM forms a pixelated image; although each micromirror operates in a binary mode, the DS is capable to control pattern edges with subpixel resolution. This is because the pixel size on the wafer plane is smaller than the optical resolution, and therefore multiple pixels can contribute to each point in a projected image. We report simulation results of subpixel edge placement controllability of the DS. Actual exposure results on our experimental tool are also presented.

Conference Presentation

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Yuho Kanaya, Yoji Watanabe, Yusuke Saito, Toshiaki Sakamoto, Soichi Owa, Noriyuki Hirayanagi, Thomas Koo, Craig Poppe, David Tseng, Conrad Sorensen, Hwan Lee, Stephen Renwick, and Bausan Yuan "Subpixel pattern edge placement controllability of digital scanner", Proc. SPIE 11855, Photomask Technology 2021, 1185508 (12 October 2021); https://doi.org/10.1117/12.2600898

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