Thickness dependence of properties of EUV underlayer thin films

Jae Hwan Sim; Yoo-Jin Ghang; Jung-June Lee; Jae Yun Ahn; Jae-Bong Lim; Joo Sung Lee; Min Young Jeong; Soojung Leem; Youngeun Bae; Yinjie Cen; James R. Marsh; Lei Zhang

doi:10.1117/12.2613437

25 May 2022 Thickness dependence of properties of EUV underlayer thin films

Jae Hwan Sim, Yoo-Jin Ghang, Jung-June Lee, Jae Yun Ahn, Jae-Bong Lim, Joo Sung Lee, Min Young Jeong, Soojung Leem, Youngeun Bae, Yinjie Cen, James R. Marsh, Lei Zhang

Author Affiliations +

Proceedings Volume 12055, Advances in Patterning Materials and Processes XXXIX; 120550B (2022) https://doi.org/10.1117/12.2613437
Event: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States

Abstract

In extreme ultraviolet lithography (EUVL), underlayers have been introduced to improve process window, stochastic printing failures, LWR and even photo-speed. As a result, studies about chemical and physical interactions at resist-underlayer interface have been reported and appropriate designs of silicon based hardmasks and thin organic underlayers for EUVL have been proposed for recent years. EUV underlayers are required to have not only chemical moieties for EUV specific functions but also proper physical properties. The thickness of underlayer has continuously shrink down to a few nanometers to reduce dry etch burden for effective transfer of small patterned features to substrates. In this paper, we report noticeable property variation of an organic underlayer thin film by confinement effect upon thickness reduction. We investigated the thickness effect on key factors, such as film density, coefficient of thermal expansion (CTE), film Tg and surface energy, and consequent impact on EUVL performance while chemical composition of underlayers were not altered.

Conference Presentation

Citation Download Citation

Jae Hwan Sim, Yoo-Jin Ghang, Jung-June Lee, Jae Yun Ahn, Jae-Bong Lim, Joo Sung Lee, Min Young Jeong, Soojung Leem, Youngeun Bae, Yinjie Cen, James R. Marsh, and Lei Zhang "Thickness dependence of properties of EUV underlayer thin films", Proc. SPIE 12055, Advances in Patterning Materials and Processes XXXIX, 120550B (25 May 2022); https://doi.org/10.1117/12.2613437

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