Dr. Yinjie Cen
at DuPont Electronics & Industrial
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 10 April 2024 Presentation + Paper
Yinjie Cen, Jong Keun Park, Suzanne Coley, Benjamin Naab-Rafael, Li Cui, Emad Aqad, Stefan Alexandrescu, Rochelle Rena, Sylvie Eckert, Jason Behnke, ChoongBong Lee, Karen Petrillo
Proceedings Volume 12957, 129570A (2024) https://doi.org/10.1117/12.3010931
KEYWORDS: Etching, Photoresist materials, Extreme ultraviolet lithography

Proceedings Article | 10 April 2024 Poster
Suzanne Coley, Jong Keun Park, Emad Aqad, Yinjie Cen, Li Cui, Conner Hoelzel, Benjamin Naab, Maria Melanson, Hung Tran, Stefan Alexandrescu, Rochelle Rena, Jason Behnke, Karen Petrillo
Proceedings Volume 12957, 129571Y (2024) https://doi.org/10.1117/12.3010919
KEYWORDS: Extreme ultraviolet, Stochastic processes, Etching, Photoresist processing, Photons, Manufacturing, Lithography, Design and modelling, Optical lithography, Materials processing

Proceedings Article | 9 April 2024 Paper
Yinjie Cen, Emad Aqad, Li Cui, Suzanne Coley, Jong Keun Park, Benjamin Naab-Rafael, Rochelle Rena, Tyler Paul, Sylvie Eckert, Chunyi Wu, Mike Finch, Jason Behnke, ChoongBong Lee, Karen Petrillo
Proceedings Volume 12957, 129571Z (2024) https://doi.org/10.1117/12.3010961
KEYWORDS: Polymers, Extreme ultraviolet, Absorption, Extreme ultraviolet lithography, Photoresist materials, Line width roughness, Lithography

Proceedings Article | 9 April 2024 Presentation + Paper
Xisen Hou, Yinjie Cen, Paul Baranowsky, Karen Petrillo
Proceedings Volume 12957, 1295714 (2024) https://doi.org/10.1117/12.3010862
KEYWORDS: Photoresist materials, Extreme ultraviolet lithography, Photoresist developing, Lithography

Proceedings Article | 9 April 2024 Poster + Paper
Benjamin Rafael-Naab, Jong Keun Park, Emad Aqad, Yinjie Cen, Suzanne Coley, Li Cui, Conner Hoelzel, Choong Bong Lee, Jason Behnke, Rochelle Rena, Sylvie Eckert, Stefan Alexandrescu, K. A. Niradha Sachinthani, Michael Finch, Karen Petrillo, Li Cheng
Proceedings Volume 12957, 129571S (2024) https://doi.org/10.1117/12.3010493
KEYWORDS: Defect inspection, Photoresist materials, Polymers, Line width roughness, Extreme ultraviolet lithography, Photoacid generators, Semiconducting wafers

Showing 5 of 9 publications
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