Removing metallic contaminants from photochemical solvents using advanced purification technologies

Kusum Maharjan; Iou-Sheng Ke; Sabrina Wong; Aiwen Wu; Ying Qi; James Hamzik; Lawrence Chen

doi:10.1117/12.2614308

25 May 2022 Removing metallic contaminants from photochemical solvents using advanced purification technologies

Kusum Maharjan, Iou-Sheng Ke, Sabrina Wong, Aiwen Wu, Ying Qi, James Hamzik, Lawrence Chen

Proceedings Volume 12055, Advances in Patterning Materials and Processes XXXIX; 120550V (2022) https://doi.org/10.1117/12.2614308
Event: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States

Conference Poster

Abstract

Removing metallic contaminants from the photochemical supply chain is critical for the creation of high yielding, highly reliable semiconductors. Metallic contaminants may lead to various types of defects, such as cone defects, that can result in significant yield loss and degraded long-term reliability. This makes control of metallic contaminants even more critical in advanced photolithography processes, where the device reliability demands metal contaminants at parts per trillion (ppt) levels. Previous work3 demonstrated the ability of two purifiers, Purasol^TM SP and SN, to reduce the metal contaminants in a variety of organic solvents. In this paper we will discuss our continued work to reduce contamination sources that can contribute to defect formation in photolithography applications.

Citation Download Citation

Kusum Maharjan, Iou-Sheng Ke, Sabrina Wong, Aiwen Wu, Ying Qi, James Hamzik, and Lawrence Chen "Removing metallic contaminants from photochemical solvents using advanced purification technologies", Proc. SPIE 12055, Advances in Patterning Materials and Processes XXXIX, 120550V (25 May 2022); https://doi.org/10.1117/12.2614308

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