Mask synthesis for silicon photonics devices

Rainer Zimmermann; Luis Orbe; Bernd Küchler; Ji Li; Jim Burdorf; William Stanton; Tung-Yu Su; Remco Stoffer; Ulrich Klostermann; Wolfgang Demmerle

doi:10.1117/12.2620724

25 May 2022 Mask synthesis for silicon photonics devices

Rainer Zimmermann, Luis Orbe, Bernd Küchler, Ji Li, Jim Burdorf, William Stanton, Tung-Yu Su, Remco Stoffer, Ulrich Klostermann, Wolfgang Demmerle

Author Affiliations +

Proceedings Volume 12148, Integrated Photonics Platforms II; 1214809 (2022) https://doi.org/10.1117/12.2620724
Event: SPIE Photonics Europe, 2022, Strasbourg, France

Abstract

Photonics represents a growing opportunity to design and manufacture devices and integrated circuits for applications in high-speed data communications, advanced sensing, and imaging. Photonic technologies provide orders-of-magnitude speed improvements with reduced power consumption for data transmission and ultra-sensitive sensing capabilities in multiple application domains. Curvilinear patterns are required to maintain the physical properties of light propagation. We investigate the readiness of state-of-the-art mask synthesis tools to meet the challenges for photonics devices in terms of mask data preparation and verification. We apply OPC and ILT to photonic integrated circuit designs containing components sensitive to fabrication variation, to generate Manhattan and curvilinear mask data. Results are validated using a lithography verification tool considering smoothness of the printed curved structures, a key factor to maintain the correct functionality of the photonic devices. Rather than using ideal targets, we take simulation contours from corrected layouts for initial assessment of light propagation through wave guides. The impact of lithographic patterning related perturbations such as resist line edge roughness on optical performance is investigated based on results from a rigorous lithography process simulation model. Experimental data from fabricated devices underline the usefulness of lithography simulation to predict unwanted impact on device performance and the need of correction tools to counteract these effects.

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Citation Download Citation

Rainer Zimmermann, Luis Orbe, Bernd Küchler, Ji Li, Jim Burdorf, William Stanton, Tung-Yu Su, Remco Stoffer, Ulrich Klostermann, and Wolfgang Demmerle "Mask synthesis for silicon photonics devices", Proc. SPIE 12148, Integrated Photonics Platforms II, 1214809 (25 May 2022); https://doi.org/10.1117/12.2620724

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