Optimizing a synchrotron based x-ray lithography system for IC manufacturing

Stephen Kovacs; Kenneth Speiser; Winston Thaw; Richard N. Heese

doi:10.1117/12.20154

1 May 1990 Optimizing a synchrotron based x-ray lithography system for IC manufacturing

Stephen Kovacs, Kenneth Speiser, Winston Thaw, Richard N. Heese

Proceedings Volume 1263, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX; (1990) https://doi.org/10.1117/12.20154
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

The electron storage ring is a realistic solution as a radiation source for production grade, industrial X-ray lithography system. Today several large scale plans are in motion to design and implement synchrotron storage rings of different types for this purpose in the USA and abroad. Most of the scientific and technological problems related to the physics, design and manufacturing engineering, and commissioning of these systems for microlithography have been resolved or are under extensive study. However, investigation on issues connected to application of Synchrotron Orbit Radiation (SOR ) in chip production environment has been somewhat neglected. In this paper we have filled this gap pointing out direct effects of some basic synchrotron design parameters and associated subsystems (injector, X-ray beam line) on the operation and cost of lithography in production. The following factors were considered: synchrotron configuration, injection energy, beam intensity variability, number of beam lines and wafer exposure concept. A cost model has been worked out and applied to three different X-ray Lithography Source (XLS) systems. The results of these applications are compared and conclusions drawn.

Citation Download Citation

Stephen Kovacs, Kenneth Speiser, Winston Thaw, and Richard N. Heese "Optimizing a synchrotron based x-ray lithography system for IC manufacturing", Proc. SPIE 1263, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX, (1 May 1990); https://doi.org/10.1117/12.20154

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