Novel surface silylation process for chemically amplified photoresist

Sung-Ho Lee; Jin Hong; Sang-Gyun Woo; Hang-Goo Cho; Woo-Sung Han

doi:10.1117/12.474176

24 July 2002 Novel surface silylation process for chemically amplified photoresist

Sung-Ho Lee, Jin Hong, Sang-Gyun Woo, Hang-Goo Cho, Woo-Sung Han

Proceedings Volume 4690, Advances in Resist Technology and Processing XIX; (2002) https://doi.org/10.1117/12.474176
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

A vapor phase silylation process after wet development allows a patterned resist film to have etch resistance similar to that of bi-layer resist. In our study, the mixture of dimethylsilyldimethylamine(DMSDMA) and bis(dimethylamino)methylsilane(B(DMA)MS) was used as a silylation agent. DMSDMA was an effective silylation agent providing silicon compound quickly into resist film and also, had a role of improving the line edge roughness (LER) of resist pattern profile. Bi(DMA)MS, was added as a cross linker to prevent the resist flow due to the drop of glass transition temperature(Tg) of the resist film during silylation. Thermally stable silylated resist pattern was baked at 160 degree(s)C in order to control critical dimension(CD) bias generated by volume expansion during silylation, without desilylation arising at the typical silylation process using DMSMA.

Citation Download Citation

Sung-Ho Lee, Jin Hong, Sang-Gyun Woo, Hang-Goo Cho, and Woo-Sung Han "Novel surface silylation process for chemically amplified photoresist", Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); https://doi.org/10.1117/12.474176

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available