Mask error tensor and causality of mask error enhancement for low-k1 imaging: theory and experiments

Chun-Kuang Chen; Tsai-Sheng Gau; Jaw-Jung Shin; Ru-Gun Liu; Shinn Sheng Yu; Anthony Yen; Burn Jeng Lin

doi:10.1117/12.474574

30 July 2002 Mask error tensor and causality of mask error enhancement for low-k₁ imaging: theory and experiments

Chun-Kuang Chen, Tsai-Sheng Gau, Jaw-Jung Shin, Ru-Gun Liu, Shinn Sheng Yu, Anthony Yen, Burn Jeng Lin

Proceedings Volume 4691, Optical Microlithography XV; (2002) https://doi.org/10.1117/12.474574
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Three important concepts about the mask error enhancement factor (MEEF) are proposed in this paper. From the fundamental assumption, the MEEF is derived to be a function of the image log slope and the aerial image variation caused by mask making error. Secondly, a mask error common window indicator (MECWIN) is proposed to evaluate the MEEF and mask CD specification by knowing the wafer CD tolerance. This concept is used to define the mask CD specification without any ambiguity. Finally, we describe the complex two-dimensional response to the mask making error around the line-end by a mask error enhancement tensor. Both theoretical derivations and experiments to justify the theory are presented in this paper.

Citation Download Citation

Chun-Kuang Chen, Tsai-Sheng Gau, Jaw-Jung Shin, Ru-Gun Liu, Shinn Sheng Yu, Anthony Yen, and Burn Jeng Lin "Mask error tensor and causality of mask error enhancement for low-k₁ imaging: theory and experiments", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); https://doi.org/10.1117/12.474574

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