Overlay improvement by using new framework of grid compensation for matching

Ayako Sukegawa; Shinji Wakamoto; Shinichi Nakajima; Masaharu Kawakubo; Nobutaka Magome

doi:10.1117/12.656876

24 March 2006 Overlay improvement by using new framework of grid compensation for matching

Ayako Sukegawa, Shinji Wakamoto, Shinichi Nakajima, Masaharu Kawakubo, Nobutaka Magome

Proceedings Volume 6152, Metrology, Inspection, and Process Control for Microlithography XX; 61523A (2006) https://doi.org/10.1117/12.656876
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

Overlay accuracy is a key issue in the semiconductor manufacturing process. To achieve overlay requirements, we developed compensation functions, i.e. Enhanced Global Alignment (EGA), Super Distortion Matching (SDM), and Grid Compensation for Matching (GCM). These functions are capable to reduce all the components except local linear components caused by a wafer global deformation. In this paper we introduce a novel correction framework which includes new compensation function called Shot Correction by Grid Parameter; thereby enabling further enhancements to overlay. Using this novel framework, we show both simulation and experimental data demonstrating improved overlay accuracy.

Citation Download Citation

Ayako Sukegawa, Shinji Wakamoto, Shinichi Nakajima, Masaharu Kawakubo, and Nobutaka Magome "Overlay improvement by using new framework of grid compensation for matching", Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61523A (24 March 2006); https://doi.org/10.1117/12.656876

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