Nobutaka Magome
Sr. V.P. at Nikon Research Corp of America
SPIE Involvement:
Publications (19)

SPIE Journal Paper | 5 August 2014 Open Access
Kyoichi Suwa, Koji Kaise, Hiroki Tateno, Nobutaka Magome
OE, Vol. 53, Issue 08, 084101, (August 2014)
KEYWORDS: Moire patterns, Metrology, Semiconducting wafers, Photoresist materials, Distance measurement, Photomasks, Sensors, Wafer-level optics, Image registration, Error analysis

Proceedings Article | 16 March 2009 Paper
Andrew Hazelton, Nobutaka Magome, Shinji Wakamoto, Akira Tokui, Céline Lapeyre, Sébastien Barnola, Guillaume Jullien, Vincent Salvetat
Proceedings Volume 7274, 72740X (2009)
KEYWORDS: Double patterning technology, Optical alignment, Semiconducting wafers, Optical lithography, Distortion, Etching, Overlay metrology, Lithography, Reticles, Logic

Proceedings Article | 16 March 2009 Paper
Proceedings Volume 7274, 72740W (2009)
KEYWORDS: Double patterning technology, Etching, Semiconducting wafers, Lithography, Photomasks, Image processing, Photoresist processing, Reticles, Line width roughness, Overlay metrology

SPIE Journal Paper | 1 January 2009
JM3, Vol. 8, Issue 01, 011003, (January 2009)
KEYWORDS: Double patterning technology, Photomasks, Etching, Reticles, Lithography, Optical lithography, Semiconducting wafers, Image processing, Photoresist processing, Deposition processes

Proceedings Article | 4 December 2008 Paper
Proceedings Volume 7140, 714028 (2008)
KEYWORDS: Double patterning technology, Reticles, Semiconducting wafers, Lithography, Etching, Photomasks, Distortion, Photoresist processing, Interferometers, Logic

Showing 5 of 19 publications
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