Molecular glass photoresists based on acidolysis of acetal compounds

Liyuan Wang; Xiaoxiao Zhai; Na Xu

doi:10.1117/12.774605

26 March 2008 Molecular glass photoresists based on acidolysis of acetal compounds

Liyuan Wang, Xiaoxiao Zhai, Na Xu

Proceedings Volume 6923, Advances in Resist Materials and Processing Technology XXV; 69231K (2008) https://doi.org/10.1117/12.774605
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

Molecular glass resists are low molecular-weight organic photoresist materials that readily form stable amorphous glasses above room temperature. They can lead to high resolution patterns. New families of ester acetal molecular glass materials have been created by the reaction between monocarboxylic acid and divinyl ethers. These organic materials are monodisperse and amorphous. They can be dissolved in common solvents and possess high thermal stability. The ester acetal compounds can be quickly decomposed at the presence of strong acid generated by photoacid generator (PAG) at room temperature or higher temperature and become easily soluble in dilute aqueous base. They can form positive photoresists together with PAG. The lithographic performance of the resist materials is being evaluated.

Citation Download Citation

Liyuan Wang, Xiaoxiao Zhai, and Na Xu "Molecular glass photoresists based on acidolysis of acetal compounds", Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 69231K (26 March 2008); https://doi.org/10.1117/12.774605

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