Coater/developer-based techniques to improve high-resolution EUV patterning

Kanzo Kato; Lior Huli; David Hetzer; Steven Grzeskowiak; Alexandra Krawicz; Nayoung Bae; Satoru Shimura; Shinichiro Kawakami; Yuhei Kuwahara; Cong Que Dinh; Soichiro Okada; Takahiro Kitano; Seiji Nagahara; Akihiro Sonoda

doi:10.1117/12.2642878

31 October 2022 Coater/developer-based techniques to improve high-resolution EUV patterning

Kanzo Kato, Lior Huli, David Hetzer, Steven Grzeskowiak, Alexandra Krawicz, Nayoung Bae, Satoru Shimura, Shinichiro Kawakami, Yuhei Kuwahara, Cong Que Dinh, Soichiro Okada, Takahiro Kitano, Seiji Nagahara, Akihiro Sonoda

Author Affiliations +

Proceedings Volume PC12292, International Conference on Extreme Ultraviolet Lithography 2022; PC122920Q (2022) https://doi.org/10.1117/12.2642878
Event: SPIE Photomask Technology + EUV Lithography, 2022, Monterey, California, United States

Conference Poster

Abstract

As the semiconductor industry continues to push the limits of integrated circuit fabrication, reliance on extreme ultraviolet lithography (EUVL) has increased. New techniques and methods are needed to mitigate pattern defectivity and roughness using both lithography and etch processes to eliminate film-related defects. These approaches require further improvements to the process chemicals and the lithography process equipment to achieve finer patterns. Additionally, underlayers and resist optimization play a significant role in resist pattern fidelity. This paper reviews the ongoing progress in coater/developer processes that are required to enable EUV patterning by using chemically amplified and metal oxide resists. We will discuss several new techniques for pattern defectivity, roughness, and EUV dose- to- size reduction using coater/developer processes. In addition, we will review our study with various underlayers to enable smaller minimum critical dimension size.

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Kanzo Kato, Lior Huli, David Hetzer, Steven Grzeskowiak, Alexandra Krawicz, Nayoung Bae, Satoru Shimura, Shinichiro Kawakami, Yuhei Kuwahara, Cong Que Dinh, Soichiro Okada, Takahiro Kitano, Seiji Nagahara, and Akihiro Sonoda "Coater/developer-based techniques to improve high-resolution EUV patterning", Proc. SPIE PC12292, International Conference on Extreme Ultraviolet Lithography 2022, PC122920Q (31 October 2022); https://doi.org/10.1117/12.2642878

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