Kanzo Kato
at TEL Technology Ctr America LLC
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 10 April 2024 Poster
Proceedings Volume PC12953, PC129530Y (2024) https://doi.org/10.1117/12.3010880
KEYWORDS: Yield improvement, Optical lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Etching, Lithography, Tin, Semiconductors, Integrated circuits, Inspection

Proceedings Article | 9 April 2024 Poster + Paper
Kayoko Cho, Hikari Tomori, Cong Que Dinh, Seiji Nagahara, Arisa Hara, Seiji Fujimoto, Arnaud Dauendorffer, Lior Huli, Kanzo Kato, Nathan Antonovich, Makoto Muramatsu
Proceedings Volume 12957, 129571Q (2024) https://doi.org/10.1117/12.3010231
KEYWORDS: Chemically amplified resists, Extreme ultraviolet, Quenching, Extreme ultraviolet lithography, Line width roughness, Etching, Line edge roughness, Stochastic processes, High volume manufacturing, Semiconductors

Proceedings Article | 9 April 2024 Presentation + Paper
Cong Que Dinh, Seiji Nagahara, Kayoko Cho, Hikari Tomori, Yuhei Kuwahara, Tomoya Onitsuka, Soichiro Okada, Shinichiro Kawakami, Arisa Hara, Seiji Fujimoto, Makoto Muramatsu, Reiko Tsuzuki, Xiang Liu, Arame Thiam, Yannick Feurprier, Kathleen Nafus, Michael Carcasi, Lior Huli, Kanzo Kato, Alexandra Krawicz, Michael Kocsis, Peter De Schepper, Lauren McQuade, Kazuki Kasahara, Jara Garcia Santaclara, Rik Hoefnagels, Bruno La Fontaine, Ryan Miyakawa, Chris Anderson, Patrick Naulleau
Proceedings Volume 12957, 1295705 (2024) https://doi.org/10.1117/12.3010207
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Inspection, Tin, Lithography, Etching

Proceedings Article | 28 November 2023 Presentation + Paper
Proceedings Volume PC12750, PC127500G (2023) https://doi.org/10.1117/12.2687901
KEYWORDS: Optical lithography, Extreme ultraviolet lithography, Lithography, Semiconductors, Integrated circuits, Industry, Fiber optic illuminators, Fabrication, Etching

Proceedings Article | 21 November 2023 Presentation + Paper
Cong Que Dinh, Seiji Nagahara, Kanzo Kato, Shinichiro Kawakami, Yuhei Kuwahara, Soichiro Okada, Kayoko Cho, Hikari Tomori, Junji Nakamura, Shoichi Terada, Makoto Muramatsu, Alexandra Krawicz, Kathleen McInerney, Nathan Antonovich, Lior Huli
Proceedings Volume 12750, 1275009 (2023) https://doi.org/10.1117/12.2687434
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Scanners, Photoresist processing, Metals

Showing 5 of 14 publications
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