Deep-learning denoiser-assisted framework for robust SEM contour extraction and analysis for advanced semiconductor node

Bappaditya Dey; Sandip Halder; Argho Das; SAYANTAN DAS; STEWART WU; Germain Fenger

doi:10.1117/12.2645403

31 October 2022 Deep-learning denoiser-assisted framework for robust SEM contour extraction and analysis for advanced semiconductor node

Bappaditya Dey, Sandip Halder, Argho Das, SAYANTAN DAS, STEWART WU, Germain Fenger

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Proceedings Volume PC12292, International Conference on Extreme Ultraviolet Lithography 2022; PC122920Z (2022) https://doi.org/10.1117/12.2645403
Event: SPIE Photomask Technology + EUV Lithography, 2022, Monterey, California, United States

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Bappaditya Dey, Sandip Halder, Argho Das, SAYANTAN DAS, STEWART WU, and Germain Fenger "Deep-learning denoiser-assisted framework for robust SEM contour extraction and analysis for advanced semiconductor node", Proc. SPIE PC12292, International Conference on Extreme Ultraviolet Lithography 2022, PC122920Z (31 October 2022); https://doi.org/10.1117/12.2645403

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