Jieun Lee
at SK Hynix, Inc.
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 10 April 2024 Poster + Paper
Honggoo Lee, Jieun Lee, Dongyong Lee, Seungmo Hong, Jaewook Seo, Minho Jeong, Hongpeng Su, Almog Aviv, Junho Kim, Nanglyeom Oh, Dongsub Choi, Tal Yaziv, Liu Liu, Richard Wang, Ohad Bachar, Renan Milo, Roie Volkovich
Proceedings Volume 12955, 129552K (2024) https://doi.org/10.1117/12.3010159
KEYWORDS: Overlay metrology, Metrology, Diffraction gratings, Diffraction, Simulations, Opacity, Semiconducting wafers, Optical parametric oscillators, Scatterometry, Measurement uncertainty

Proceedings Article | 26 March 2019 Paper
Honggoo Lee, Sangjun Han, Minhyung Hong, Jieun Lee, Dongyoung Lee, Ahlin Choi, Chanha Park, Dohwa Lee, Seongjae Lee, Jungtae Lee, Jeongpyo Lee, DongSub Choi, Sanghuck Jeon, Zephyr Liu, Hao Mei, Tal Marciano, Eitan Hajaj, Lilach Saltoun, Dana Klein, Eran Amit, Anna Golotsvan, Wayne Zhou, Eitan Herzel, Roie Volkovich, John Robinson
Proceedings Volume 10959, 109591E (2019) https://doi.org/10.1117/12.2515015
KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Scatterometry, Wafer-level optics, Manufacturing, Quality measurement, Imaging systems, Scanning electron microscopy, Diffractive optical elements

Proceedings Article | 27 April 2018 Paper
Einat Peled, Eran Amit, Yuval Lamhot, Alexander Svizher, Dana Klein, Anat Marchelli, Roie Volkovich, Tal Yaziv, Aaron Cheng, Honggoo Lee, Sangjun Han, Minhyung Hong, Seungyoung Kim, Jieun Lee, Dongyoung Lee, Eungryong Oh, Ahlin Choi, DongSub Choi, DoHwa Lee, Sanghuck Jeon, Jungtae Lee, Seongjae Lee, Zephyr Liu, Jeongpyo Lee, John Robinson
Proceedings Volume 10585, 105850S (2018) https://doi.org/10.1117/12.2300507
KEYWORDS: Metrology, Semiconducting wafers, Laser scattering, Laser metrology, Overlay metrology, Quality measurement, Scatterometry, Apodization, Polarization, Image quality

Proceedings Article | 13 March 2018 Paper
Proceedings Volume 10585, 105852A (2018) https://doi.org/10.1117/12.2299976
KEYWORDS: Semiconducting wafers, Metrology, Critical dimension metrology, Scanners, Process control, Modulation, Scatterometry, Finite element methods, Signal to noise ratio, Single crystal X-ray diffraction

Proceedings Article | 13 March 2018 Paper
Honggoo Lee, Yoonshik Kang, Sangjoon Han, Kyuchan Shim, Minhyung Hong, Seungyoung Kim, Jieun Lee, Dongyoung Lee, Eungryong Oh, Ahlin Choi, Youngsik Kim, Tal Marciano, Dana Klein, Eitan Hajaj, Sharon Aharon , Guy Ben-Dov , Saltoun Lilach, Dan Serero, Anna Golotsvan
Proceedings Volume 10585, 1058532 (2018) https://doi.org/10.1117/12.2300153
KEYWORDS: Overlay metrology, Semiconducting wafers, Diffraction, Light sources, Imaging technologies, Integrated circuits, Visible radiation, Optical testing, Electromagnetism, Signal processing

Showing 5 of 6 publications
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