Karsten Branz
Process & Research & Development Engineer at HamaTech AG
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Contamination, Etching, Glasses, Particles, Silver, Manufacturing, Inspection, Oxygen, Photomasks, Phase shifts

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