Dr. Mark I. Wagner
Senior Research Scientist at Micell Technologies Inc
SPIE Involvement:
Publications (5)

Proceedings Article | 23 March 2007 Paper
Amy Zweber, Mark Wagner, Ruben Carbonell
Proceedings Volume 6519, 651948 (2007) https://doi.org/10.1117/12.712093
KEYWORDS: Photoresist materials, Head-mounted displays, Photoresist developing, Coating, Semiconducting wafers, Atomic force microscopy, Adhesives, Crystals, Carbon dioxide, Standards development

Proceedings Article | 11 April 2006 Paper
Mark Wagner, James DeYoung, Chris Harbinson, Merrick Miles
Proceedings Volume 6153, 615346 (2006) https://doi.org/10.1117/12.656272
KEYWORDS: Standards development, Diffractive optical elements, Line width roughness, Extreme ultraviolet, Photoresist developing, Statistical analysis, Photoresist materials, Line edge roughness, Temperature metrology, Carbon dioxide

Proceedings Article | 11 April 2006 Paper
Vassilios Constantoudis, Evangelos Gogolides, George Patsis, Mark Wagner, James DeYoung, Chris Harbinson
Proceedings Volume 6153, 61533W (2006) https://doi.org/10.1117/12.656579
KEYWORDS: Line width roughness, Semiconducting wafers, Standards development, Extreme ultraviolet, Critical dimension metrology, Line edge roughness, Image processing, Image analysis, Software development, Scanning electron microscopy

Proceedings Article | 11 April 2006 Paper
Mark Wagner, James De Young, Chris Harbinson
Proceedings Volume 6153, 61531I (2006) https://doi.org/10.1117/12.655880
KEYWORDS: Standards development, Semiconducting wafers, Extreme ultraviolet, Chemistry, Photoresist developing, Line width roughness, Photoresist processing, Extreme ultraviolet lithography, Image processing, Photoresist materials

Proceedings Article | 11 April 2006 Paper
James DeYoung, Mark Wagner, Chris Harbinson, Merrick Miles, Amy Zweber, Ruben Carbonell
Proceedings Volume 6153, 615345 (2006) https://doi.org/10.1117/12.655881
KEYWORDS: Photoresist materials, Photoresist developing, Standards development, Semiconducting wafers, Polymers, Crystals, Quartz, Extreme ultraviolet, Photoresist processing, Extreme ultraviolet lithography

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