Dr. Amy E. Zweber
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (19)

PROCEEDINGS ARTICLE | October 4, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Electron beam lithography, Electrons, Manufacturing, Inspection, Image resolution, Photomasks, Extreme ultraviolet, SRAF, Line edge roughness, EUV optics

PROCEEDINGS ARTICLE | May 10, 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Logic, Opacity, Etching, Inspection, Chromium, Attenuators, Photomasks, SRAF, Phase shifts

PROCEEDINGS ARTICLE | October 17, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Logic, Switching, Opacity, Etching, Dry etching, Manufacturing, Image resolution, Scanning electron microscopy, SRAF, Critical dimension metrology

PROCEEDINGS ARTICLE | October 1, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Metrology, Logic, Data modeling, Chromium, Photomasks, Immersion lithography, SRAF, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Optical microscopes, Switches, Switching, Ultraviolet radiation, Silicon, Lamps, Inspection, Chromium, Photomasks, Semiconducting wafers

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Lithography, Lithographic illumination, Linear filtering, Photoresist materials, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers

Showing 5 of 19 publications
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