Dr. Shiyu Sun
Senior Process Integration Engineer at Applied Materials Inc
SPIE Involvement:
Publications (3)

Proceedings Article | 23 March 2011 Paper
Ping Xu, Yongmei Chen, Yijian Chen, Liyan Miao, Shiyu Sun, Sung-Woo Kim, Ami Berger, Daxin Mao, Christ Bencher, Raymond Hung, Chris Ngai
Proceedings Volume 7973, 79731Q (2011) https://doi.org/10.1117/12.881547
KEYWORDS: Etching, Optical lithography, Silicon, Scanning electron microscopy, Line width roughness, Lithography, Double patterning technology, Semiconducting wafers, Oxides, Neodymium

Proceedings Article | 16 March 2009 Paper
Huixiong Dai, Chris Bencher, Yongmei Chen, Shiyu Sun, Xumou Xu, Chris Ngai
Proceedings Volume 7274, 72743G (2009) https://doi.org/10.1117/12.814376
KEYWORDS: Optical alignment, Semiconducting wafers, Photomasks, Double patterning technology, Optical lithography, Scanners, Etching, Chemical vapor deposition, Manufacturing, Lithography

Proceedings Article | 16 March 2009 Paper
Shiyu Sun, Chris Bencher, Yongmei Chen, Huixiong Dai, Man-Ping Cai, Jaklyn Jin, Pokhui Blanco, Liyan Miao, Ping Xu, Xumou Xu, James Yu, Raymond Hung, Shiany Oemardani, Osbert Chan, Chorng-Ping Chang, Chris Ngai
Proceedings Volume 7274, 72740D (2009) https://doi.org/10.1117/12.814403
KEYWORDS: Lithography, Resistance, Etching, Double patterning technology, Photomasks, Optical lithography, Scanning electron microscopy, Oxides, Photoresist materials, Line edge roughness

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