Dr. Yaojun Du
at Semiconductor Manufacturing International Corp
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Wafer-level optics, Data modeling, Scattering, Calibration, Printing, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Binary data, Model-based design

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Logic, Phase modulation, Visualization, Photomasks, Double patterning technology, Computational lithography, Optical proximity correction, SRAF, Model-based design

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Wafer-level optics, Lithography, Cadmium, Scanners, Manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Optics manufacturing

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Detection and tracking algorithms, Etching, Printing, Photomasks, Semiconductor manufacturing, Optical proximity correction, Semiconducting wafers, Model-based design, Resolution enhancement technologies

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