Dr. Christian D. Zuniga
Machine Learning Scientist
SPIE Involvement:
Publications (21)

Proceedings Article | 20 March 2018 Presentation + Paper
Yaojun Du, Liang Li, Jingjing Zhang, Feng Shao, Christian Zuniga, Yunfei Deng
Proceedings Volume 10587, 105870Q (2018) https://doi.org/10.1117/12.2295451
KEYWORDS: Printing, Scattering, Data modeling, Optical proximity correction, Semiconducting wafers, Calibration, Binary data, Critical dimension metrology, Model-based design, Wafer-level optics

Proceedings Article | 24 March 2017 Presentation + Paper
Xiren Wang, Yuri Granik, Nikolay Elistratov, Christian Zuniga, Ana-Maria Armeanu, Junghwan Choi, Youngseok Woo
Proceedings Volume 10147, 1014715 (2017) https://doi.org/10.1117/12.2258346
KEYWORDS: Optical proximity correction, Critical dimension metrology, Anisotropy, Printing, Finite-difference time-domain method, Field effect transistors, Lithographic illumination, Computational lithography, Image processing, Process control, Semiconducting wafers, Reflection, 3D modeling, Silicon, Cadmium, Solids

Proceedings Article | 24 March 2016 Paper
Proceedings Volume 9778, 97781Q (2016) https://doi.org/10.1117/12.2218534
KEYWORDS: Metrology, Optical proximity correction, Calibration, Data modeling, Photomasks, Lithography, 3D modeling, Electrons, Scanning electron microscopy, Semiconducting wafers, Monte Carlo methods

Proceedings Article | 18 March 2015 Paper
Proceedings Volume 9426, 94261R (2015) https://doi.org/10.1117/12.2086468
KEYWORDS: 3D modeling, Diffusion, Cadmium, Calibration, Optical proximity correction, Convolution, Systems modeling, System on a chip, Etching, SRAF

SPIE Journal Paper | 6 November 2014
JM3, Vol. 13, Issue 04, 043010, (November 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.043010
KEYWORDS: Optical proximity correction, Calibration, Diffusion, Cadmium, 3D modeling, Semiconducting wafers, Critical dimension metrology, Photoresist processing, SRAF, Etching

Showing 5 of 21 publications
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