Dr. Christian D. Zuniga Profile

Dr. Christian D. Zuniga

Machine Learning Scientist

SPIE Involvement:

Author

Publications (21)

Proceedings Article | 20 March 2018 Presentation + Paper

A model-based approach for the scattering-bar printing avoidance

Yaojun Du, Liang Li, Jingjing Zhang, Feng Shao, Christian Zuniga, Yunfei Deng

Proceedings Volume 10587, 105870Q (2018) https://doi.org/10.1117/12.2295451

KEYWORDS: Printing, Scattering, Data modeling, Optical proximity correction, Semiconducting wafers, Calibration, Binary data, Critical dimension metrology, Model-based design, Wafer-level optics

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Proceedings Article | 24 March 2017 Presentation + Paper

FinFET-induced anisotropy in printing of implantation shapes

Xiren Wang, Yuri Granik, Nikolay Elistratov, Christian Zuniga, Ana-Maria Armeanu, Junghwan Choi, Youngseok Woo

Proceedings Volume 10147, 1014715 (2017) https://doi.org/10.1117/12.2258346

KEYWORDS: Optical proximity correction, Critical dimension metrology, Anisotropy, Printing, Finite-difference time-domain method, Field effect transistors, Lithographic illumination, Computational lithography, Image processing, Process control, Semiconducting wafers, Reflection, 3D modeling, Silicon, Cadmium, Solids

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Proceedings Article | 24 March 2016 Paper

Modeling metrology for calibration of OPC models

Chris Mack, Ananthan Raghunathan, John Sturtevant, Yunfei Deng, Christian Zuniga, Kostas Adam

Proceedings Volume 9778, 97781Q (2016) https://doi.org/10.1117/12.2218534

KEYWORDS: Metrology, Optical proximity correction, Calibration, Data modeling, Photomasks, Lithography, 3D modeling, Electrons, Scanning electron microscopy, Semiconducting wafers, Monte Carlo methods

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Proceedings Article | 18 March 2015 Paper

Resist profile modeling with compact resist model

Christian Zuniga, Yunfei Deng, Yuri Granik

Proceedings Volume 9426, 94261R (2015) https://doi.org/10.1117/12.2086468

KEYWORDS: 3D modeling, Diffusion, Cadmium, Calibration, Optical proximity correction, Convolution, Systems modeling, System on a chip, Etching, SRAF

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SPIE Journal Paper | 6 November 2014

Resist toploss and profile modeling for optical proximity correction applications

Christian Zuniga, Yunfei Deng

JM3, Vol. 13, Issue 04, 043010, (November 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.043010

KEYWORDS: Optical proximity correction, Calibration, Diffusion, Cadmium, 3D modeling, Semiconducting wafers, Critical dimension metrology, Photoresist processing, SRAF, Etching

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Proceedings Article | 31 March 2014 Paper

Rapid, accurate improvement in 3D mask representation via input geometry optimization and crosstalk

David Fryer, Michael Lam, Kostas Adam, Chris Clifford, Mike Oliver, Christian Zuniga, John Sturtevant, ChangAn Wang, Scott Mansfield

Proceedings Volume 9052, 905216 (2014) https://doi.org/10.1117/12.2046489

KEYWORDS: Photomasks, 3D modeling, Calibration, Source mask optimization, Data modeling, Semiconducting wafers, Performance modeling, Tolerancing, Metrology, Manufacturing

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Proceedings Article | 31 March 2014 Paper

Resist toploss modeling for OPC applications

Christian Zuniga, Yunfei Deng

Proceedings Volume 9052, 905227 (2014) https://doi.org/10.1117/12.2048124

KEYWORDS: Calibration, Diffusion, 3D modeling, Optical proximity correction, Cadmium, SRAF, Neodymium, Etching, Scanning electron microscopy, Critical dimension metrology

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Proceedings Article | 12 April 2013 Paper

Accurate 3DEMF mask model for full-chip simulation

Michael Lam, Kostas Adam, David Fryer, Christian Zuniga, Haiqing Wei, Michael Oliver, Chris Clifford

Proceedings Volume 8683, 86831D (2013) https://doi.org/10.1117/12.2013167

KEYWORDS: Photomasks, Polarization, Scattering, Near field, Light scattering, Optical proximity correction, Semiconducting wafers, Systems modeling, Error analysis, Solids

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Proceedings Article | 23 March 2012 Paper

3D mask modeling for EUV lithography

Julien Mailfert, Christian Zuniga, Vicky Philipsen, Konstantinos Adam, Michael Lam, James Word, Eric Hendrickx, Geert Vandenberghe, Bruce Smith

Proceedings Volume 8322, 832224 (2012) https://doi.org/10.1117/12.918267

KEYWORDS: Photomasks, Extreme ultraviolet, 3D modeling, Reflectivity, Extreme ultraviolet lithography, Calibration, Semiconducting wafers, Scanners, Mirrors, Visualization

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Proceedings Article | 13 March 2012 Paper

OPC model prediction capability improvements by accounting for mask 3D-EMF effects

Jacky Cheng, Jessy Schramm, Dong Qing Zhang, Yee Mei Foong, Christian Zuniga, Thuy Do, Edita Tejnil, John Sturtevant, Angeline Chung, Kenneth Jantzen

Proceedings Volume 8326, 83261R (2012) https://doi.org/10.1117/12.916863

KEYWORDS: 3D modeling, Data modeling, Photomasks, Calibration, Performance modeling, Semiconducting wafers, Optical proximity correction, Systems modeling, Panoramic photography, System on a chip

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Proceedings Article | 14 October 2011 Paper

The trade-offs between thin and thick absorbers for EUV photomasks

Gregory McIntyre, Christian Zuniga, Emily Gallagher, John Whang, Louis Kindt

Proceedings Volume 8166, 81663U (2011) https://doi.org/10.1117/12.898912

KEYWORDS: Photomasks, Extreme ultraviolet, Critical dimension metrology, Nanoimprint lithography, Semiconducting wafers, Line width roughness, Reflectivity, Phase shifts, Stray light, Data modeling

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Proceedings Article | 14 October 2011 Paper

OPC modeling and correction solutions for EUV lithography

James Word, Christian Zuniga, Michael Lam, Mohamed Habib, Kostas Adam, Michael Oliver

Proceedings Volume 8166, 81660Q (2011) https://doi.org/10.1117/12.899591

KEYWORDS: Optical proximity correction, Photomasks, Reticles, Extreme ultraviolet lithography, Model-based design, Reflectivity, 3D modeling, Extreme ultraviolet, Optical lithography, Semiconducting wafers

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Proceedings Article | 6 April 2011 Paper

EUV OPC for 56nm metal pitch

Martin Burkhardt, Matt Colburn, Yunfei Deng, Emily Gallagher, Hirokazu Kato, Greg McIntyre, Karen Petrillo, Sudhar Raghunathan, Adam Smith, Tom Wallow, Obert Wood, Yi Zou, Christian Zuniga

Proceedings Volume 7969, 79690U (2011) https://doi.org/10.1117/12.879931

KEYWORDS: Photomasks, Optical proximity correction, Calibration, Back end of line, Extreme ultraviolet, Extreme ultraviolet lithography, Scanning electron microscopy, Printing, Photoresist processing, Distortion

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Proceedings Article | 5 April 2011 Paper

EUV flare and proximity modeling and model-based correction

Christian Zuniga, Mohamed Habib, James Word, Gian Lorusso, Eric Hendrickx, Burak Baylav, Raghu Chalasani, Michael Lam

Proceedings Volume 7969, 79690T (2011) https://doi.org/10.1117/12.879488

KEYWORDS: Extreme ultraviolet, Optical proximity correction, Data modeling, Model-based design, Photomasks, Point spread functions, Calibration, Extreme ultraviolet lithography, Fractal analysis, 3D modeling

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Proceedings Article | 10 March 2010 Paper

Improved process window modeling techniques

Christian Zuniga, Tamer Tawfik

Proceedings Volume 7640, 76403A (2010) https://doi.org/10.1117/12.846792

KEYWORDS: Calibration, Data modeling, Process modeling, Optical proximity correction, Optical calibration, Critical dimension metrology, Data processing, Photoresist processing, Finite element methods, Instrument modeling

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SPIE Journal Paper | 1 October 2009

Flare in extreme ultraviolet lithography: metrology, out-of-band radiation, fractal point-spread function, and flare map calibration

Gian Lorusso, Frieda Van Roey, Eric Hendrickx, Germain Fenger, Michael Lam, Christian Zuniga, Mohamed Habib, Hesham Diab, James Word

JM3, Vol. 8, Issue 04, 041505, (October 2009) https://doi.org/10.1117/12.10.1117/1.3238515

KEYWORDS: Metrology, Fractal analysis, Point spread functions, Extreme ultraviolet lithography, Extreme ultraviolet, Deep ultraviolet, Calibration, Scanning electron microscopy, Visualization, Convolution

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Proceedings Article | 16 March 2009 Paper

Modeling laser bandwidth for OPC applications

Christian Zuniga, Kostas Adam, Michael Lam, Ivan Lalovic, Peter De Bisschop

Proceedings Volume 7274, 72741O (2009) https://doi.org/10.1117/12.813869

KEYWORDS: Data modeling, Calibration, Optical proximity correction, Chromatic aberrations, Cadmium, Critical dimension metrology, Laser applications, Systems modeling, Image processing, Laser scanners

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Proceedings Article | 16 March 2009 Paper

New approach to determine best beam focus

Christian Zuniga, Tamer Tawfik

Proceedings Volume 7274, 72742S (2009) https://doi.org/10.1117/12.814015

KEYWORDS: Diffraction, Calibration, Optical proximity correction, Critical dimension metrology, Optical simulations, Optical lithography, Resolution enhancement technologies, Thin films, Beam analyzers, Process modeling

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Proceedings Article | 12 March 2008 Paper

Development of a computational lithography roadmap

J. Fung Chen, Hua-Yu Liu, Thomas Laidig, Christian Zuniga, Yu Cao, Robert Socha

Proceedings Volume 6924, 69241C (2008) https://doi.org/10.1117/12.773060

KEYWORDS: Optical proximity correction, Extreme ultraviolet, Computational lithography, Photomasks, Lithography, Calibration, Extreme ultraviolet lithography, Manufacturing, Resolution enhancement technologies, Polarization

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Proceedings Article | 30 October 2007 Paper

Validation of a fast and accurate 3D mask model for SRAF printability analysis at 32nm node

Peng Liu, Christian Zuniga, Zhongtuan Ma, Hanying Feng

Proceedings Volume 6730, 67301R (2007) https://doi.org/10.1117/12.746704

KEYWORDS: 3D modeling, Photomasks, SRAF, Fiber optic illuminators, Semiconducting wafers, Calibration, Cadmium sulfide, Computer simulations, Fourier transforms, 3D image processing

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Proceedings Article | 26 March 2007 Paper

Heuristics for truncating the number of optical kernels in Hopkins image calculations for model-based OPC treatment

Christian Zuniga, Edita Tejnil

Proceedings Volume 6520, 65203I (2007) https://doi.org/10.1117/12.712625

KEYWORDS: Thin films, Optical proximity correction, Systems modeling, Model-based design, Imaging systems, Polarization, Image acquisition, System on a chip, Error analysis, Lithography

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Showing 5 of 21 publications

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