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Yu Mu
at Beijing Superstring Academy of Memory Technology
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Author
Publications (3)
Proceedings Article | 10 April 2024 Poster + Paper
Balancing mask manufacturability and image quality with inverse lithography: a study on variable fracture sizes
Proceedings Volume 12953, 1295310 (2024) https://doi.org/10.1117/12.3010071
KEYWORDS: Optical proximity correction, Manufacturing, Lithography, Image quality, Vestigial sideband modulation, Scanning electron microscopy, Critical dimension metrology, Image processing, Shape analysis, Compliance
Proceedings Article | 21 November 2023 Poster + Paper
Rounded-corner aware OPC for convergency and lithography performance improving
Proceedings Volume 12751, 1275115 (2023) https://doi.org/10.1117/12.2686228
KEYWORDS: Optical proximity correction, Lithography, Photoresist processing, Reliability, Photoresist materials, Mask making, Manufacturing, Integrated circuits, Electron beams, Chip manufacturing
Proceedings Article | 21 November 2023 Poster + Paper
Quantitative study of local MEEF of 2D mask corrected by inverse lithography technology
Futian Wang, Song Sun, Chunlong Yu, Yu Mu, Juan Wei, Xiaonan Liu, Cuixiang Wang, Liang Li, Qingchen Cao, Miao Jiang, Peng Xu, Joshua Jeong, Yilei Zeng, Andy Lan, Jiangliu Shi
Proceedings Volume 12751, 1275117 (2023) https://doi.org/10.1117/12.2686740
KEYWORDS: Optical proximity correction, Lithography, Semiconducting wafers, Resolution enhancement technologies, Logic, Electron beam lithography, Vestigial sideband modulation, Photomask technology, Manufacturing
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