Mr. Chunlong Yu Profile

Chunlong Yu

at Beijing Superstring Academy of Memory Technology

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Author

Publications (4)

Proceedings Article | 10 April 2024 Poster + Paper

Balancing mask manufacturability and image quality with inverse lithography: a study on variable fracture sizes

Fu Li, Yu Mu, Jingjing Fan, Chunlong Yu, Ruihua Liu, Song Sun, Chong Wang, Jiangliu Shi, Qingchen Cao

Proceedings Volume 12953, 1295310 (2024) https://doi.org/10.1117/12.3010071

KEYWORDS: Optical proximity correction, Manufacturing, Lithography, Image quality, Vestigial sideband modulation, Scanning electron microscopy, Critical dimension metrology, Image processing, Shape analysis, Compliance

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Proceedings Article | 21 November 2023 Poster + Paper

Quantitative study of local MEEF of 2D mask corrected by inverse lithography technology

Futian Wang, Song Sun, Chunlong Yu, Yu Mu, Juan Wei, Xiaonan Liu, Cuixiang Wang, Liang Li, Qingchen Cao, Miao Jiang, Peng Xu, Joshua Jeong, Yilei Zeng, Andy Lan, Jiangliu Shi

Proceedings Volume 12751, 1275117 (2023) https://doi.org/10.1117/12.2686740

KEYWORDS: Optical proximity correction, Lithography, Semiconducting wafers, Resolution enhancement technologies, Logic, Electron beam lithography, Vestigial sideband modulation, Photomask technology, Manufacturing

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Proceedings Article | 21 November 2023 Poster + Paper

Rounded-corner aware OPC for convergency and lithography performance improving

Ruihua Liu, Fu Li, Chunlong Yu, Jingjing Fan, Yu Mu, Song Sun, Chong Wang, Jiangliu Shi, Qingchen Cao

Proceedings Volume 12751, 1275115 (2023) https://doi.org/10.1117/12.2686228

KEYWORDS: Optical proximity correction, Lithography, Photoresist processing, Reliability, Photoresist materials, Mask making, Manufacturing, Integrated circuits, Electron beams, Chip manufacturing

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Proceedings Article | 28 April 2023 Poster + Paper

Hybrid deep learning OPC framework with generative adversarial network

Qingchen Cao, Peng Xu, Juan Wei, Ruihua Liu, Fu Li, Jingjing Fan, Chunlong Yu, Zhifeng Li, Jiangliu Shi, Yayi Wei

Proceedings Volume 12495, 124951R (2023) https://doi.org/10.1117/12.2658271

KEYWORDS: Optical proximity correction, Photomasks, Design and modelling, Lithography, Deep learning, Adversarial training, Machine learning

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