Taking a SHARP look at mask 3D effects

Markus P. Benk; Weilun Chao; Ryan Miyakawa; Kenneth Goldberg; Patrick Naulleau

doi:10.1117/12.2281109

27 October 2017 Taking a SHARP look at mask 3D effects

Markus P. Benk, Weilun Chao, Ryan Miyakawa, Kenneth Goldberg, Patrick Naulleau

Proceedings Volume 10450, International Conference on Extreme Ultraviolet Lithography 2017; 104500Y (2017) https://doi.org/10.1117/12.2281109
Event: SPIE Photomask Technology and EUV Lithography, 2017, Monterey, California, United States

Abstract

Mask 3D effects are an area of active research in EUV mask technology. Mask-side numerical aperture, illumination, feature size and absorber thickness are key factors modulating mask 3D effects and affecting printability and process window. Variable mask-side NA and flexible illumination make the SHARP actinic EUV microscope a powerful instrument for the study of mask 3D effects. We show an application example, comparing mask 3D effects for a standard Tantalum Nitride absorber and a thinner, 40-nm Nickel absorber. Data is presented for 0.33 4xNA and anamorphic 0.55 4x/8xNA. The influence of different illumination settings on mask 3D effects is discussed.

Citation Download Citation

Markus P. Benk, Weilun Chao, Ryan Miyakawa, Kenneth Goldberg, and Patrick Naulleau "Taking a SHARP look at mask 3D effects", Proc. SPIE 10450, International Conference on Extreme Ultraviolet Lithography 2017, 104500Y (27 October 2017); https://doi.org/10.1117/12.2281109

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