Understanding quencher mechanisms by considering photoacid-dissociation equilibrium in chemically amplified resists

Seiji Nagahara; Lei Yuan; Wojtek Jacob Poppe; Andrew Neureuther; Yoshiyuki Kono; Atsushi Sekiguchi; Koichi Fujiwara; Tsuyoshi (Gary) Watanabe; Kazuo Taira; Shiro Kusumoto; Takanori Nakano; Tsutomu Shimokawa

doi:10.1117/12.598949

4 May 2005 Understanding quencher mechanisms by considering photoacid-dissociation equilibrium in chemically amplified resists

Seiji Nagahara, Lei Yuan, Wojtek Jacob Poppe, Andrew Neureuther, Yoshiyuki Kono, Atsushi Sekiguchi, Koichi Fujiwara, Tsuyoshi (Gary) Watanabe, Kazuo Taira, Shiro Kusumoto, Takanori Nakano, Tsutomu Shimokawa

Author Affiliations +

Proceedings Volume 5753, Advances in Resist Technology and Processing XXII; (2005) https://doi.org/10.1117/12.598949
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

The quencher mechanisms in Chemically-Amplified (CA) resists have been investigated. To explain the acid distribution with a variety of acid strengths in the presence of quencher, a new full Acid-Equilibrium-Quencher model (AEQ model) is proposed and examined in solid-model-CA-resist systems. To observe the reactions in the CA resists, real-time Fourier-Transform-Infrared Spectroscopy (FTIR) is employed during post-exposure bake (PEB). The FTIR peaks of the protection groups are detected to measure the reaction kinetics during PEB. The solid-model-CA resists used in this work consist of both a KrF-acetal-type resist with a diazomethane Photo-Acid Generator (PAG) (weaker-photoacid system) and an ArF-ester-type resist with a sulfonium-salt PAG (stronger-photoacid system). The obtained FTIR results are analyzed using conventional Full-Dissociation-Quencher model (FDQ model) and the new AEQ model. The kinetic analysis of the model resists was performed for different quencher loadings. For the weaker-photoacid system, the AEQ model much more accurately predicts the deprotection-reaction kinetics than the FDQ model with the change of quencher content. This suggests the necessity of introduction of the acid-dissociation concept in the case of the weaker photoacid. For the stronger-photoacid system, both the AEQ and conventional FDQ models adequately predict the kinetic results. This shows that the conventional FDQ model is accurate enough to simulate the super-strong photoacid system. Finally, the new AEQ model is introduced in the UC Berkeley STORM resist simulator. Some simulation examples are shown in the paper.

Citation Download Citation

Seiji Nagahara, Lei Yuan, Wojtek Jacob Poppe, Andrew Neureuther, Yoshiyuki Kono, Atsushi Sekiguchi, Koichi Fujiwara, Tsuyoshi (Gary) Watanabe, Kazuo Taira, Shiro Kusumoto, Takanori Nakano, and Tsutomu Shimokawa "Understanding quencher mechanisms by considering photoacid-dissociation equilibrium in chemically amplified resists", Proc. SPIE 5753, Advances in Resist Technology and Processing XXII, (4 May 2005); https://doi.org/10.1117/12.598949

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available