Dr. David M. Fried
Vice President Computational Products at Coventor Inc
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Optical lithography, Etching, Metals, Photoresist materials, Capacitance, Transistors, Double patterning technology, Critical dimension metrology, Line edge roughness, Photoresist processing, Back end of line, Front end of line

SPIE Journal Paper | September 13, 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Directed self assembly, Etching, Optical lithography, Process modeling, Capacitors, Device simulation, 3D modeling, Polymers, Virtual reality, Reactive ion etching

PROCEEDINGS ARTICLE | March 23, 2016
Proc. SPIE. 9782, Advanced Etch Technology for Nanopatterning V
KEYWORDS: Lithography, Optical lithography, Spatial frequencies, Etching, Line width roughness, Deposition processes, Line edge roughness, Process modeling, Back end of line, Fin field effect transitor

PROCEEDINGS ARTICLE | March 22, 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Semiconductors, Lithography, Logic, Optical lithography, Capacitors, Etching, Polymers, Interfaces, 3D modeling, Software development, Directed self assembly, Transistors, Reactive ion etching, Virtual reality, Optimization (mathematics), Process modeling, Device simulation

PROCEEDINGS ARTICLE | May 6, 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Semiconductors, Lithography, Electron beam lithography, Optical lithography, Etching, Metals, Optical alignment, Photoresist processing, Semiconducting wafers, Overlay metrology

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