Deanna Soucie
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 18 April 2017 Presentation + Paper
William Earley, Deanna Soucie, Kenji Hosoi, Arata Takahashi, Takashi Aoki, Brian Cardineau, Koichi Miyauchi, Jay Chun, Michael O'Sullivan, Robert Brainard
Proceedings Volume 10146, 101460H (2017) https://doi.org/10.1117/12.2258324
KEYWORDS: Photoresist materials, Extreme ultraviolet, Lithography, Extreme ultraviolet lithography, Polymers, Line width roughness, Solids, Polymerization, Sodium, Glasses

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