Dr. Hans M. Martinsson
Optics Physicist at Micronic Laser Systems AB
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | November 5, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Coherence imaging, Mirrors, Imaging systems, Printing, Spatial light modulators, Solids, Photomasks, Raster graphics, Mask making, Vestigial sideband modulation

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Coherence imaging, Mirrors, Imaging systems, Calibration, Printing, Spatial light modulators, Solids, Micromirrors, Photomasks, Mask making

SPIE Journal Paper | January 1, 2005
JM3 Vol. 4 Issue 01
KEYWORDS: Mirrors, Spatial light modulators, Reticles, Maskless lithography, Photomasks, Semiconducting wafers, Scanners, Wafer-level optics, Lithography, Raster graphics

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Mirrors, Reticles, Printing, Spatial light modulators, Photomasks, Maskless lithography, Raster graphics, Nanoimprint lithography, Phase shifts

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Mirrors, Reticles, Scanners, Spatial light modulators, Photomasks, Optical proximity correction, Maskless lithography, Raster graphics, Binary data, Phase shifts

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Mirrors, Deep ultraviolet, Manufacturing, Spatial light modulators, Solids, Photomasks, Optical simulations, Image enhancement, Optical proximity correction, Raster graphics

Showing 5 of 6 publications
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